Structure and Properties of Indium Tin Oxide Thin Films Sputtered from Different Target Densities
- Resource Type
- Academic Journal
- Authors
- Kyoo Ho Kim; Young Hee Jung; Badrul Munir; Engineering
- Source
- 한국표면공학회지. 2005-10 38(5):179-182
- Subject
- ITO thin films
Transparent semiconductor
Sputtering
Target density
Characterization
- Language
- Korean
- ISSN
- 1225-8024
2299-8403
Indium Tin Oxide (ITO) thin films were deposited from various target densities (98.7%-99.6%) using RF magnetron sputtering. Effect of the sputtering target densities on the structural, electrical and optical properties of deposited ITO thin films was investigated. The preferable (400) crystalline orientation peak was observed on the films deposited from>99.0% target density. Higher target density produced films with higher roughness but lower resistivity. All of the deposited films showed optical transmittance more than 85% in the visible wavelength region. It is necessary to use the highest target density for sputtering deposition of ITO thin films.