고성능 TFT 소자 응용을 위한 폴리스티렌 나노입자를이용한 나노 그물망 제작공정 개발
Formation of nanonet structure using polystyrene nanoparticle for high-performances TFT applications.
- Resource Type
- Article
- Authors
- 윤길상; 이준영; 박익수; Bo Jin; 이정수
- Source
- 반도체디스플레이기술학회지, 17(3), 64, pp.36-40 Sep, 2018
- Subject
- 전기공학
- Language
- 한국어
- ISSN
- 1738-2270
We have developed a nonlithographic patterning technique using polystyrene nanoparticles to form nanonet channel structures which is promising for high-performance TFT applications. Nanoparticles assisted patterning (NAP) is a technique to form uniform nano-patterns by applying lift-off and dry etch process. Oxygen plasma treatment was used to control the diameters of nanonet hole size to realize a branch width down to 100 nm. NAP technology can be very promising to fabricate nanonet structure with advantages of lower manufacturing cost and large-area patterning capability.