Non-doped Titanium Oxide Films for Transparent Conductive Oxides Fabricated by Plasma-assisted Deposition / プラズマアシスト蒸着法による透明導電膜に向けたノンドープ・チタン酸化物薄膜の形成
- Resource Type
- Journal Article
- Authors
- Hideki OHNO; Takahisa ICHINOHE; 一戸 隆久; 大野 秀樹
- Source
- 表面と真空 / Vacuum and Surface Science. 2019, 62(7):406
- Subject
- multi-capillary
plasma-assisted deposition
titanium oxide
transparent conducting films
- Language
- Japanese
- ISSN
- 2433-5835
2433-5843
We fabricated non-doped titanium dioxide films using plasma-assisted deposition. According to X-ray diffraction (XRD) analyses, the crystal structures of as-grown films were almost amorphous without depending on the oxygen plasma concentration. The transmittance spectra showed about 60% transparency in visible light wavelength when the films were fabricated with 40%-O2 plasma, and then it was experimentally found to reveal lower resistivity than the other O2 concentrations. The resistivity obtained by present study were quite lower than the other reports in non-doped films as-grown. It is suggested that the conduction mechanism in the films can be attributed to the oxygen vacancy as considering the characteristics after post-annealing.