Microstructure of Electrodeposited Co-W Alloy Films / 電析Co-W合金めっき膜の微細構造
- Resource Type
- Journal Article
- Authors
- Feng Wang; Kiyoshi Itoh; Tohru Watanabe; 伊藤 清; 渡辺 徹; 王 峰
- Source
- 日本金属学会誌 / Journal of the Japan Institute of Metals and Materials. 2003, 67(9):499
- Subject
- amorphous
cobalt-Tungsten
electrodeposition
microstructure
thermal equilibrium diagram
- Language
- Japanese
- ISSN
- 0021-4876
1880-6880
The structures of Co-W binary alloy films electrodeposited at different bath concentrations and different electrodeposition conditions have been studied in detail by means of XRD and HRTEM. The crystallization sequences of deposited films under the heat-treatment were examined by XRD. The structures of Co-W deposited films were also compared with the Co-W thermal equilibrium phase diagram. The results indicated that the structures of Co-W deposited films gradually change from crystalline to amorphous phase with increasing W content in the deposited films. The deposited film exists as crystalline when the W if below 24.8 at%, whereas it exists as a homogenous amorphous phase when the W is from 25.4 at% to 26.0 at%. Accordingly, the composition of boundary between the crystalline and homogenous amorphous states can be determined at about 25.1 at%W.