Contributors
- Resource Type
- Authors
- Antonov, I.N.; Belov, A.I.; Bonafos, C.; Brivio, S.; Cario, Laurent; Carrada, M.; Caussat, Brigitte; Ch. Sirakoulis, Georgios; Christensen, Dennis Valbjørn; Cianci, Elena; Corraze, Benoit; Demin, V.A.; Dimitrakis, P.; Emelyanov, A.V.; Escudero, Manuel; Esposito, Vincenzo; Filatov, D.O.; Giannopoulos, Georgios; Gorshkov, O.N.; Gourbilleau, F.; Gryaznov, E.G.; Guseinov, D.V.; Hoffmann, Michael; Janod, Etienne; Kaidatzis, Andreas; Khomenkhova, L.; Korolev, D.S.; Koryazhkina, M.N.; Li, Yang; Liu, Qi; Max, Benjamin; Mikhaylov, A.N.; Mikolajick, Thomas; Mulaosmanovic, Halid; Niarchos, Dimitris; Nikiruy, K.E.; Normand, P.; Okulich, E.V.; Okulich, V.I.; Pavlov, D.A.; Pryds, Nini; Ramkumar, Krishnaswamy; Rubio, Antonio; Rylkov, V.V.; Sanna, Simone; Schamm-Chardon, S.; Schroeder, Uwe; Shenina, M.E.; Shuisky, R.A.; Sidorenko, K.V.; Slaoui, A.; Slesazeck, Stefan; Spagnolo, B.; Spiga, Sabina; Talbot, E.; Tappertzhofen, Stefan; Tetelbaum, D.I.; Tikhov, S.V.; Tranchant, Julien; Vahlas, Constantin; Vianello, E.; Vourkas, Ioannis; Zhao, Xiaolong
- Source
- In Metal Oxides for Non-volatile Memory 2022:ix-xi
- Subject
- Language