Surface Modification to Improve the Electrochemical Performance of Neural Microelectrode Arrays
- Resource Type
- Conference
- Authors
- Yang, Shuguang; Yang, Yujie; Geng, Liang; Adedokum, George; Xie, Dongcheng; Liu, Ruichen; Xu, Lei
- Source
- 2021 5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) Electron Devices Technology & Manufacturing Conference (EDTM), 2021 5th IEEE. :1-3 Apr, 2021
- Subject
- Bioengineering
Components, Circuits, Devices and Systems
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Fields, Waves and Electromagnetics
Photonics and Electrooptics
Micromechanical devices
Surface impedance
Gold
Microelectrodes
Mass production
Neural microtechnology
Surface roughness
neural microelectrodes
MEMS
metal film
impedance
- Language
In this work, two different methods are used to modify the surface of the electrode sites in order to improve the electrochemical performance of the microelectrodes. One is sputtering gold under low vacuum conditions which presents a low impedance of $286.1\mathrm{K}\Omega$ (72.9% reduction), and the other is electrochemical deposition of gold which reduces the impedance to $157\mathrm{K}\Omega$ (85.1 % reduction). The two methods have different characteristics and both have effectively improve the performance of the electrode.