Foundry compatible, efficient wafer-scale manufacturing of ultra-low loss, high-density Si3N4 photonic integrated circuits
- Resource Type
- Conference
- Authors
- Ji, Xinru; Wang, Rui Ning; Liu, Yang; Riemensberger, Johann; Qiu, Zheru; Kippenberg, Tobias J.
- Source
- 2024 Optical Fiber Communications Conference and Exhibition (OFC) Optical Fiber Communications Conference and Exhibition (OFC), 2024. :1-3 Mar, 2024
- Subject
- Communication, Networking and Broadcast Technologies
Photonics and Electrooptics
Optical losses
Photonic integrated circuits
Propagation losses
Foundries
Optical fiber communication
Manufacturing
System-on-chip
- Language
We demonstrate ultra-low propagation loss, lithographic precision, and wafer-scale manufacturing for high-density Si 3 N 4 photonic integrated circuits using an efficient DUV-based subtractive approach. We show a propagation loss as low as 1.4 dB/m at 1.55 µm.