Device performances can be improved by means of nanotcchnology using nanoparticles at certain quantities. AFM (atomic force microscopy) deals with scanning technique to provide on high resolution, 3 D images of sample surfaces. These surfaces included in this paper are related to devices with specific conductivity and must be characterized in terms of metrics, and imaging. The characterization intends to point out spurious nanoparticles that would have been produced during the fabrication process. Spurious particles can change electric resistance, hence conductivity with a huge impact in nanoscale. Imaging is here used to decide if spurious nanoparticles, in terms of quality, arc acceptable or not.