Large Area Fine Line Patterning by Scanning Projection Lithography
- Resource Type
- Conference
- Authors
- Muller, H.G.; Yanrong Yuan; Sheets, R.E.
- Source
- Proceedings of the International Conference on Multichip Modules Multichip Modules, 1994. Proceedings of the 1994 International Conference on. :100-104 1994
- Subject
- Computing and Processing
Lithography
Optical distortion
Optical films
Costs
Substrates
Manufacturing
Laminates
Optical design
Geometry
Transistors
- Language
A new type of photolithography tool has been developed, addressing the specific needs of MCM manufacture. It is based on scanning projection exposure. It can expose panels at variable sizes up to 500 mm by 600 mm (typical laminate size), with an optical resolution of less than 5 gm and an overlay accuracy of 2 /spl mu/m (typical thin film design rules). With the exposure being a mask projection, mask damage and subsequent yield problems are generally avoided.