Development of ECR sheet plasma source for ion-enhanced reactive sputter deposition
- Resource Type
- Conference
- Authors
- Wakatsuchi, M.; Ishii, S.; Kato, Y.; Sunagawa, M.; Tani, F.
- Source
- Proceedings of 11th International Conference on Ion Implantation Technology Ion implantation technology Ion Implantation Technology. Proceedings of the 11th International Conference on. :800-803 1996
- Subject
- Fields, Waves and Electromagnetics
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Plasma sources
Sputtering
Plasma waves
Optical films
Permanent magnets
Slot antennas
Optical waveguides
Cathodes
Optical mixing
Optical refraction
- Language
An ECR plasma source is developed to generate rectilinearly uniform plasmas 20 cm in width. The source consists of a pair of permanent magnets and a slot antenna (slotted waveguide). The poles of the magnets face oppositely each other and a line cusp field is generated in a vacuum chamber. The antenna is set in between the magnets. Uniform O/sub 2/ plasmas are obtained in the range of 20 cm. The source is combined with a magnetron sputtering cathode and applies to ion-enhanced reactive sputtering deposition. Films of TiO/sub 2/ are deposited for optical coatings. Refractive index of 2.5 is obtained by reactive sputtering in the oxygen ECR plasma. The deposition rate increased by a factor of four with O/sub 2//Ar mixing gas.