[Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on. :76-79 1993
Subject
Components, Circuits, Devices and Systems Engineered Materials, Dielectrics and Plasmas Computing and Processing Predictive models Surface cleaning Sputter etching Substrates Dry etching Chemicals Amplitude shift keying Sputtering Flowcharts Topology