The influence of contact mode on resolution in UV 400 lithography
- Resource Type
- Conference
- Authors
- Indykiewicz, Kornelia; Macherzynski, Wojciech; Paszkiewicz, Regina
- Source
- 2011 International Students and Young Scientists Workshop "Photonics and Microsystems" Students and Young Scientists Workshop, 2011 International. :59-61 Jul, 2011
- Subject
- Photonics and Electrooptics
Communication, Networking and Broadcast Technologies
Components, Circuits, Devices and Systems
Computing and Processing
Lithography
Resists
Optical device fabrication
Adaptive optics
Photonics
Gold
- Language
- ISSN
- 1939-4381
Optical lithography is the most popular lithographic technique in modern semiconductor manufacture. High pattern resolution is very desirable parameter in many devices. Because of that different contact methods were investigated. In the article we present influence of contact modes between the mask and the sample on pattern resolution. We defined the maximal resolution of test structures obtained for various distances of proximity contacts in optical lithography process.