Direct and all-dry microfabrication of ultramicroelectrode based on cold atmospheric microplasma jet
- Resource Type
- Conference
- Authors
- Xi, Y.; Wang, L.C.; Guo, Z.J.; Yang, B.; Liu, J. Q.
- Source
- 2021 IEEE 16th International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) Nano/Micro Engineered and Molecular Systems (NEMS), 2021 IEEE 16th International Conference on. :959-962 Apr, 2021
- Subject
- Bioengineering
Components, Circuits, Devices and Systems
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Fields, Waves and Electromagnetics
Photonics and Electrooptics
Power, Energy and Industry Applications
Robotics and Control Systems
Electrochemical deposition
Microfabrication
Metals
Machining
Micromachining
Etching
Plasmas
- Language
- ISSN
- 2474-3755
We develop a direct and all-dry microfabrication method of ultramicroelectrode based on cold atmospheric microplasma jet. The microfabrication process includes micropipette preparation, metal sputtering, chemical vapor deposition of parylene-C layer and microplasma jet micromachining (Fig. 1). The generated microplasma jet can effectively remove the polymer layer on the tip. The exposed metal part can be used as ultramicroelectrode point or further modified with electrochemical deposition and other methods. The exposed area can be controlled by the treatment time and the average etching rate is approximately $1.1 \mu\mathrm{m}/\mathrm{s}$. Due to the properties of cold atmospheric microplasma jet, the microfabrication can be realized without high-precision machining and vacuum equipment.