A new developed in-line dose monitor
- Resource Type
- Conference
- Authors
- Hisamune, T.; Niikura, K.; Kimura, N.; Yokoo, H.; Nishihashi, T.; Kashimoto, K.; Samurada, Y.; Kitamura, T.; Takeshita, M.; Yajima, T.; Yasaka, M.
- Source
- 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) Ion implantation technology Ion Implantation Technology Proceedings, 1998 International Conference on. 1:411-415 vol.1 1999
- Subject
- Fields, Waves and Electromagnetics
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Monitoring
Pollution measurement
Scanning probe microscopy
Mass production
Measurement standards
Ion implantation
Semiconductor device manufacture
Density measurement
Standards development
Cathodes
- Language
For the new generation ion implantation, a standard criterion in order to evaluate the uniformity and the absolute dose for low dose implantation down to 1E11/cm/sup 2/ is indispensable. A dose monitor of multi-Faraday type has been developed and incorporated into the newly released ion implanter IW-series, This monitor realizes in-line calibration over the wide energy range from several hundred to several keV. The system structure and characteristics will be discussed.