Correlation Between CD/LWR and Focus Level Fitting Error: A Process Quality Indicator
- Resource Type
- Conference
- Authors
- Huang, Tianhao; Liu, Pan; Chen, Zeyang; Li, Sheng; Gao, Dawei; Zhou, Guodong
- Source
- 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) Science and Technology for Integrated Circuits (CSTIC), 2024 Conference of. :1-3 Mar, 2024
- Subject
- Bioengineering
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Engineering Profession
Photonics and Electrooptics
Integrated circuits
Correlation
Fitting
Measurement uncertainty
Lithography
Resists
Production
CD
LWR
CD uniformity
focus level fitting error
process quality
- Language
Achieving uniformity of patterns on photoresists is a significant challenge as process nodes get smaller. In practical production lines, the level sensor (LS) of the lithography system will record the focus level to calculate fitting errors and correct the focus level errors automatically during exposure. In this study, we present the analysis of the inherent adjustment errors stemming from the LS process dependency. Additionally, we propose a correlation analysis method that utilizes the focus level fitting errors alongside the measured data including uniformity of critical dimension (CD) and line width roughness (LWR). The correlation can serve as an indicator of process quality and offer guidance for further process optimization.