Characterization of Vapor Adsorption on the Surface of Si Spheres by Ellipsometry
- Resource Type
- Conference
- Authors
- Fujita, Kazuaki; Kuramoto, Naoki; Mizushima, Shigeki; Fujii, Kenichi
- Source
- 2018 Conference on Precision Electromagnetic Measurements (CPEM 2018) Precision Electromagnetic Measurements (CPEM 2018), 2018 Conference on. :1-2 Jul, 2018
- Subject
- Fields, Waves and Electromagnetics
Silicon
Adsorption
Ellipsometry
Standards
Stability analysis
Crystals
Vacuum systems
Avogadro constant
silicon crystal
spectroscopic ellipsometer
surface absorption
vacuum measurement
- Language
- ISSN
- 2160-0171
For the determination of the Avogadro constant using the x-ray crystal density method, surface analysis of Si spheres is essential. The difference of the surface layer thickness in vacuum and in air conditions was investigated by ellipsometry. In order to estimate the effect of vapor adsorption on the determination of the thickness of the surface layer of Si spheres, an ellipsometer with vacuum chamber and vapor controlling system is proposed.