Gate Dielectrics for High Performance and Low Power CMOS SoC Applications
- Resource Type
- Conference
- Authors
- Cubaynes, F.; Dachs, C.; Detcheverry, C.; Zegers, A.; Venezia, V.; Schmitz, J.; Stolk, P.; Jurczak, M.; Henson, K.; Degraeve, R.; Rothschild, A.; Conard, T.; Petry, J.; Da Rold, M.; Schaekers, M.; Badenes, G.; Date, L.; Pique, D.; Al-Shareef, H.; Murto, R.
- Source
- 32nd European Solid-State Device Research Conference Solid-State Device Research Conference, 2002. Proceeding of the 32nd European. :427-430 2002
- Subject
- Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Dielectrics
System-on-a-chip
Annealing
Plasma applications
Plasma devices
Plasma materials processing
Rapid thermal processing
Oxidation
Furnaces
Implants
- Language