A CMOS-Compatible, Low-Loss, and Low-Crosstalk Silicon Waveguide Crossing
- Resource Type
- Periodical
- Authors
- Zhang, Y.; Yang, S.; Lim, A. E.-J.; Lo, G.-Q.; Galland, C.; Baehr-Jones, T.; Hochberg, M.
- Source
- IEEE Photonics Technology Letters IEEE Photon. Technol. Lett. Photonics Technology Letters, IEEE. 25(5):422-425 Mar, 2013
- Subject
- Engineered Materials, Dielectrics and Plasmas
Photonics and Electrooptics
Optical waveguides
Silicon
Photonics
Insertion loss
Couplers
Gratings
CMOS integrated circuits
Silicon on insulator technology
wafer scale integration
waveguide junctions
- Language
- ISSN
- 1041-1135
1941-0174
We demonstrated a waveguide crossing for submicron silicon waveguides with average insertion loss of ${\rm 0.18}{\pm}{\rm 0.03}~{\rm dB}$ and crosstalk of ${-}{\rm 41}{\pm}{\rm 2}~{\rm dB}$, uniform across an 8-inch wafer. The device was fabricated in a CMOS-compatible process using 248 nm lithography, with only one patterning step.