Micromachined sensors using polysilicon sacrificial layer etching technology
- Resource Type
- Conference
- Authors
- Sugiyama, S.; Tabata, O.; Shimaoka, K.; Asahi, R.
- Source
- Proceedings of 1994 IEEE International Electron Devices Meeting Electron devices Electron Devices Meeting, 1994. IEDM '94. Technical Digest., International. :127-130 1994
- Subject
- Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Photonics and Electrooptics
Etching
Isolation technology
Infrared sensors
Optical sensors
Assembly
Costs
Silicon
Thermal sensors
Pyroelectricity
Optical device fabrication
- Language
- ISSN
- 0163-1918
Sensor assembly is one of the key technologies to improve the cost performance of silicon sensors. As a technology to achieve this aim, polysilicon sacrificial layer etching technology is presented. As its applications, a microdiaphragm pressure sensor with a reference pressure chamber and an integrated pyroelectric infrared sensor with a thermal isolated structure are also presented. Fabrication of a micro optical chopper is shown, and the future style of sensor devices is proposed.ETX