Combined EELS, EDX, and STEM investigations of Cu-induced nanostrucutures and thin surface layer phases
- Resource Type
- research-article
- Authors
- Hollensteiner, S.; Sigle, W.; Spiecker, E.; Jäger, W.
- Source
- International Journal of Materials Research. 96(8):888-893
- Subject
- Metal deposition
Self-assembled surface nanostructures
Layered chalcogenides
Electron energy loss spectroscopy
Scanning transmission electron microscopy
Articles Basic
- Language
- English
- ISSN
- 2195-8556
1862-5282
Surfaces of layered VSe2 crystals with self-assembled networks of nanostructures formed during the early stages of Cu deposition have been investigated by high-angle annular dark-field imaging in scanning transmission electron microscopy, energy-dispersive X-ray spectroscopy, and energy-loss near-edge structure measurements in electron energy-loss spectroscopy at high spatial resolutions. The investigations confirm that the nanostructures are elevated surface folds and that the deposited copper is rather uniformly distributed across the VSe2 surface mesh regions and the nanostructure regions. The electron energy loss near-edge structure of the L2.3 ionization edges depict that the electronic properties of Cu are modified in regard to metallic Cu, and that the electronic properties of V are modified in regard to VSe2 layered crystals while the ionization edges of Se are largely unaffected. The observations are consistent with results of structure analyses and suggest that different types of Cu-rich crystalline intercalation compounds form at the surfaces upon Cu deposition.