集成电路钴化学机械抛光缺陷控制的研究进展 / Research Progress of Cobalt CMP Defect Control in Integrated Circuits
- Resource Type
- Academic Journal
- Source
- 润滑与密封 / Lubrication Engineering. 48(7):190-197
- Subject
集成电路 钴 化学机械抛光 点蚀 电偶腐蚀 integrated circuits cobalt chemical mechanical polishing pitting galvanic corrosion - Language
- Chinese
- ISSN
- 0254-0150