Feature size reduction of silicon slot waveguides by partial filling using atomic layer deposition
- Resource Type
- Authors
- Seppo Honkanen; Antti Säynätjoki; Teppo Hakkarainen; Tapani Alasaarela
- Source
- Optical Engineering. 48:080502
- Subject
- Silicon photonics
Materials science
Silicon
business.industry
General Engineering
chemistry.chemical_element
Silicon on insulator
Atomic and Molecular Physics, and Optics
Amorphous solid
Slot-waveguide
Atomic layer deposition
chemistry
Optoelectronics
Thin film
business
Refractive index
- Language
- ISSN
- 0091-3286
We propose a novel method to realize silicon-on-insulator (SOI)-based air slot waveguides for sensing applications. The method, based on feature size reduction using conformal thin films grown by atomic layer deposition (ALD), enables a guided slot mode in a silicon slot waveguide with a patterned slot width of more than 200 nm. Feature size reduction of slot structures with ALD grown amorphous TiO2 is demonstrated.