Nanoimprint lithography: challenges and prospects
- Resource Type
- Authors
- J. Seekamp; C. M. Sotomayor Torres; S. Zankovych; T. Hoffmann; J. U. Bruch
- Source
- Nanotechnology. 12:91-95
- Subject
- Fabrication
Materials science
Mechanics of Materials
law
Mechanical Engineering
General Materials Science
Bioengineering
Nanotechnology
General Chemistry
Electrical and Electronic Engineering
Throughput (business)
Nanoimprint lithography
law.invention
- Language
- ISSN
- 1361-6528
0957-4484
We review the salient aspects of nanoimprint lithography and consider the challenges it faces in becoming a standard fabrication technique, such as costs and throughput. We discuss material issues such as visco-elasticity and functionality of the printed material. By way of an illustration, we present printing results of 50?nm features over a 2?2?cm2 area which are reproducible with high fidelity. Data of printing 15?nm features in PMMA using a Cr stamp was obtained.