New Photocurable Acrylic/Silsesquioxane Hybrid Optical Materials: Synthesis, Properties, and Patterning
- Resource Type
- Authors
- Hung-Wen Su; Wen-Chin Lee; Wen-Chang Chen; Jinn-Shing King
- Source
- Macromolecular Materials and Engineering. 292:666-673
- Subject
- Acrylate
Materials science
Polymers and Plastics
Hydrosilylation
General Chemical Engineering
Organic Chemistry
Silsesquioxane
chemistry.chemical_compound
Monomer
Photopolymer
chemistry
Chemical engineering
Materials Chemistry
Thermal stability
Composite material
Hybrid material
Prepolymer
- Language
- ISSN
- 1438-7492
Synthesis, properties, and patterning of new acrylic/silsesquioxane hybrid materials are reported. PMA-functionalized PHSSQ was synthesized by hydrosilylation and then formulated with acrylate monomer mixtures to yield the photocurable materials. Experiments suggest that the thermal/mechanical properties of the parent acrylic polymers could be significantly enhanced by incorporating nano-sized silsesquioxane moieties. The refractive index and optical loss were reduced by increasing the silsesquioxane content. The hybrid materials could be photocured and developed a Y-shape channel pattern; potential applications include uses in patterned electronic and optoelectronic devices.