Lattice Boltzmann numerical analysis of heat transfer in nano-scale silicon films induced by ultra-fast laser heating
- Resource Type
- Authors
- Yudong Mao; Mingtian Xu
- Source
- International Journal of Thermal Sciences. 89:210-221
- Subject
- Work (thermodynamics)
Materials science
Condensed matter physics
Silicon
business.industry
technology, industry, and agriculture
General Engineering
Lattice Boltzmann methods
chemistry.chemical_element
Condensed Matter Physics
Thermal conduction
Laser
law.invention
Optics
chemistry
law
Thermal
Heat transfer
sense organs
Thin film
business
- Language
- ISSN
- 1290-0729
In the present work, the lattice Boltzmann method is employed to simulate the ultra-fast laser heating of a thin silicon film with nano-scale thickness. Our results show that the heat conduction in thin silicon films heated by ultra-fast lasers exhibits wavelike behavior which is significantly influenced by the boundary conditions at the film's surfaces. We also find that simultaneously heating both surfaces of a thin silicon film by ultra-fast lasers can induce two thermal waves traveling in the opposite directions and their interaction may cause significant temperature rise in the middle region of the thin film. Furthermore, by varying the heating delay time between two surfaces of a thin film one can change the position where the energy density achieves the highest value.