International audience; Titanium oxide is a promising material for integrated photonics that is considered to be ideal for applications in nonlinear optics due to its high refractive index matched with large transparency (for λ > 400 nm). Integrated photonic devices require high quality films to reduce optical losses [1]. Therefore, we have deposited epitaxial (00l) oriented rutile TiO2 films on M-Sapphire (101 ̅0) to diminish the defect density. To enable epitaxial lift-off, zinc oxide was used as a sacrificial layer because of epitaxial growth possibility and simple chemical etching. Using 3D high-temperature masks and deep UV lithography, the films were structured to fabricate waveguides with micron size features. Furthermore, we have demonstrated the developed layer transfer technique that allowed the transfer of epitaxial rutile films on SiO2/Si substrates. In this work we present epitaxial lift-off and 3D structuring techniques that can be used to obtain scalable, cheap and simple rutile TiO2 based structures to be applied in nonlinear optics.