Direct measurement of van der Waals and diffuse double-layer forces between titanium dioxide surfaces produced by atomic layer deposition
- Resource Type
- Authors
- William Menelaos Skinner; Rick B. Walsh; Vincent S. J. Craig; Drew F. Parsons; Andrew Nelson
- Source
- Subject
- Lifshitz theory
Chemistry
titanium dioxide
Diffuse double layer
Adhesion
surfaces
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Atomic layer deposition
symbols.namesake
chemistry.chemical_compound
General Energy
Isoelectric point
Chemical physics
Computational chemistry
Titanium dioxide
atomic layer deposition
symbols
van der Waals forces
Physical and Theoretical Chemistry
van der Waals force
- Language
- English
The van der Waals forces between titanium dioxide surfaces produced by atomic layer deposition (ALD) at the isoelectric point have been measured and found to agree with the calculated interaction using Lifshitz theory. It is shown that under the right conditions very smooth ALD surfaces are produced. At pH values slightly below and above the isoelectric point, a repulsive diffuse double-layer repulsion was observed and is attributed to positive and negative charging of the surfaces, respectively. At high pH, it was found that the forces remained repulsive up until contact and no van der Waals attraction or adhesion was evident. The absence of an attraction cannot be explained by the presence of hydration forces. Refereed/Peer-reviewed