Etch Characteristics and Mechanism of TiSbTe Thin Films in Inductively-Coupled HBr-He, Ar, N2, O2Plasma
- Resource Type
- Authors
- Yipeng Chan; Gaoming Feng; Zhen Xu; Dan Gao; Bo Liu; Weiwei Wang; Juntao Li; Qing Wang; YaoHui Zhou; Lei Wang; Zhitang Song; Yangyang Xia; Songlin Feng
- Source
- ECS Journal of Solid State Science and Technology. 5:P330-P334
- Subject
- 010302 applied physics
O2 plasma
Materials science
Chemical engineering
0103 physical sciences
02 engineering and technology
Thin film
021001 nanoscience & nanotechnology
0210 nano-technology
01 natural sciences
Mechanism (sociology)
Electronic, Optical and Magnetic Materials
- Language
- ISSN
- 2162-8777
2162-8769