Large-area pretreatment for physical vapor deposition
- Resource Type
- Authors
- S. Schiller; G. Hötzsch; F. Milde; K. Goedicke
- Source
- Subject
- Materials science
technology, industry, and agriculture
Mineralogy
Surfaces and Interfaces
General Chemistry
Plasma
Flat glass
Contamination
engineering.material
Condensed Matter Physics
Surfaces, Coatings and Films
Strip steel
Coating
Physical vapor deposition
Materials Chemistry
engineering
Composite material
Thin film
Plasma processing
- Language
- English
Illustrated by the coating of strip steel and plate glass, we discuss the possibilities of matching the vacuum pretreatment to the high coating rates of large-area physical vapor deposition. The restricted applicability of conventional plasma pretreatment methods has led to the concept of interfacial (IFL) processing. This is meant to be a method by which remaining contamination layers and adsorbates on the substrate surface are converted into a useful (often plasma activated) intermediate layer.