A Point Defect Model for Anodic Passive Films: II . Chemical Breakdown and Pit Initiation
- Resource Type
- Authors
- Digby D. Macdonald; L. F. Lin; C. Y. Chao
- Source
- Journal of The Electrochemical Society. 128:1194-1198
- Subject
- Chemical breakdown
Materials science
Aqueous solution
Renewable Energy, Sustainability and the Environment
Growth kinetics
Metallurgy
Halide
chemistry.chemical_element
Overpotential
Condensed Matter Physics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Anode
Nickel
Chemical engineering
chemistry
Materials Chemistry
Electrochemistry
- Language
- ISSN
- 1945-7111
0013-4651
The point defect model that was previously developed (1) to explain the growth kinetics of a passive film has been extended to account for chemical breakdown. This model provides quantitative explanations of the dependence of breakdown potential on halide concentration, and of the incubation time‐breakdown overpotential relationships that have been observed for iron and nickel in aqueous solutions. Limitations of the model are identified and discussed.