Application of static masking technique in magnetron sputtering technology for the production of linearly variable filters
- Resource Type
- Authors
- Harro Hagedorn; Julien Lumeau; Detlef Arhilger; Antonin Moreau; F. Lemarquis; Holger Reus; Fabien Lemarchand; Thomas Begou
- Source
- CEAS Space Journal
CEAS Space Journal, Springer, In press
CEAS Space Journal, 2021, ⟨10.1007/s12567-021-00402-3⟩
- Subject
- Masking (art)
linearly variable filters
Materials science
magnetron sputtering
business.industry
optical interference filters
Aerospace Engineering
02 engineering and technology
Sputter deposition
021001 nanoscience & nanotechnology
deposition technology
01 natural sciences
010309 optics
Variable (computer science)
Space and Planetary Science
0103 physical sciences
[SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic
Optoelectronics
Production (economics)
Optical coatings
0210 nano-technology
business
- Language
- ISSN
- 1868-2510
1868-2502
International audience; Variable filters are key components for compact spectral imagers. In this paper, we present a method for the fabrication of linearly variable filters based on Bühler HELIOS machine (plasma assisted reactive magnetron sputtering). These filters are obtained by producing a variation of the thickness of all the layers of the coating, using adapted masks placed in between the sputtering targets for the low and high refractive index materials and the substrates. Variable band pass filter from 550 nm up to 1000 nm is demonstrated.