Full-wafer, maskless patterning with sub-50nm resolution and large depth-of-focus enabled by multicolumn electron beam lithography
- Resource Type
- Article
- Source
- Proceedings of SPIE; April 2024, Vol. 12956 Issue: 1 p129560S-129560S-5, 1166046p
- Subject
- Language
- ISSN
- 0277786X