Dramatic Reduction of Silicon Surface Recombination by ALD TiOx Capping Layer from TiCl4 and H2 O: The Role of Chlorine.
- Resource Type
- Article
- Source
- ACS Applied Materials & Interfaces; 10/4/2023, Vol. 15 Issue 39, p46504-46512, 9p
- Subject
- Language
- ISSN
- 19448244