A study of patterning 36nm-pitch logic contact holes in a metal oxide resist using a high-reflectance phase-shifting mask that results in image reversal
- Resource Type
- Article
- Source
- Proceedings of SPIE; December 2022, Vol. 12293 Issue: 1 p122930C-122930C-15, 12170086p
- Subject
- Language
- ISSN
- 0277786X