Study of selective dry etching Si0.7Ge0.3with different plasma source in process of gate-all-around FET
- Resource Type
- Article
- Authors
- Mohanty, Nihar; Altamirano-Sánchez, Efrain; Liu, Enxu; Yang, Chaoran; Li, Junjie; Zhou, Na; Xia, Longrui; Chen, Rui; Shao, Hua; Gao, Jianfeng; Kong, Zhenzhen; Zhang, Chenchen; Lai, Panpan; Yang, Tao; Wei, Yayi; Li, Junfeng; Luo, Jun; Wang, Wenwu
- Source
- Proceedings of SPIE; April 2024, Vol. 12958 Issue: 1 p129580F-129580F-7, 1166228p
- Subject
- Language
- ISSN
- 0277786X