Giant Magnetoresistance in a Chemical Vapor Deposition Graphene Constriction.
- Resource Type
- Article
- Authors
- Smith, Luke W.; Batey, Jack O.; Alexander-Webber, Jack A.; Hsieh, Yu-Chiang; Fung, Shin-Jr; Albrow-Owen, Tom; Beere, Harvey E.; Burton, Oliver J.; Hofmann, Stephan; Ritchie, David A.; Kelly, Michael; Chen, Tse-Ming; Joyce, Hannah J.; Smith, Charles G.
- Source
- ACS Nano; 2/22/2022, Vol. 16 Issue 2, p2833-2842, 10p
- Subject
- Language
- ISSN
- 19360851