Negative-tone resists for EUV lithography
- Resource Type
- Article
- Authors
- Guerrero, Douglas; Amblard, Gilles R.; Suzuki, Masato; Kim, Youngjin; Her, Youngjun; Wu, Hengpeng; Si, Kun; Maturi, Mark Marcello; Fackler, Philipp Hans; Moinpour, Mansour; Dammel, Ralph; Cao, Yi
- Source
- Proceedings of SPIE; May 2023, Vol. 12498 Issue: 1 p1249813-1249813-12
- Subject
- Language
- ISSN
- 0277786X