Contact and via hole mask design optimization for 65-nm technology node.
- Resource Type
- Article
- Authors
- Van Den Broeke, Douglas; Shi, Xuelong; Socha, Robert; Laidig, Tom; Hollerbach, Uwe; Wampler, Kurt E.; Hsu, Stephen; Chen, J. Fung; Corcoran, Noel P.; Dusa, Mircea V.; Park, Jung Chul
- Source
- Proceedings of SPIE; Nov2004, Issue 1, p680-690, 11p
- Subject
- Language
- ISSN
- 0277786X