The Effect of Nitrogen Incorporation on the Optical Properties of Si-Rich a-SiCx Films Deposited by VHF PECVD.
- Resource Type
- Article
- Source
- Micromachines; Jun2021, Vol. 12 Issue 6, p637-637, 1p
- Subject
PLASMA-enhanced chemical vapor deposition OPTICAL properties PASSIVATION SILICON films - Language
- ISSN
- 2072666X