Fluorocarbon radicals and surface reactions in fluorocarbon high density etching plasma. II. H2 addition to electron cyclotron resonance plasma employing CHF3.
- Resource Type
- Article
- Source
- Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1996, Vol. 14 Issue 4, p2011-2019, 9p
- Subject
- Language
- ISSN
- 07342101