Mask absorber development to enable next-generation EUVL.
- Resource Type
- Article
- Authors
- Philipsen, Vicky; Kim Vu Luong; Opsomer, Karl; Souriau, Laurent; Rip, Jens; Detavernier, Christophe; Erdmann, Andreas; Evanschitzky, Peter; Laubis, Christian; Hönicke, Philipp; Soltwisch, Victor; Hendrickx, Eric
- Source
- Proceedings of SPIE; 8/29/2019, Vol. 11178, p1-7, 7p
- Subject
- Language
- ISSN
- 0277786X