Sub-0.25-pm 50-W amplified excimer laser system for 193-nm lithography.
- Resource Type
- Article
- Authors
- Govorkov, Sergei V.; Wiessner, Alexander O.; Hua, Gongxue; Misuryaev, Timur V.; Knysh, Andrey N.; Spratte, Stefan; Lokai, Peter; Nagy, Tamas; Bragin, Igor; Targsdorf, Andreas; Schroeder, Thomas; Albrecht, Hans-Stephan; Desor, Rainer; Schmidt, Thomas; Paetzel, Rainer
- Source
- Proceedings of SPIE; Nov2004, Issue 1, p1787-1796, 10p
- Subject
- Language
- ISSN
- 0277786X