Growth of Hafnium Dioxide Thin Films by Liquid-Injection MOCVD Using Alkylamide and Hydroxylamide Precursors (We are grateful to Epichem Limited for support of this work.).
- Resource Type
- Article
- Source
- Chemical Vapor Deposition; Dec2003, Vol. 9 Issue 6, p309-314, 6p
- Subject
- Language
- ISSN
- 09481907