Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Hydroxylamide and Water (We are grateful to Epichem for funding the work at Liverpool University. The study was supported by Academy of Finland (Projects Nos. 51989, 43329 and 44215).).
- Resource Type
- Article
- Source
- Chemical Vapor Deposition; Mar2004, Vol. 10 Issue 2, p91-96, 6p
- Subject
- Language
- ISSN
- 09481907