Single-Source Precursor for Tungsten Dichalcogenide Thin Films: Mo1-x Wx S2 (0 ≤ x ≤ 1) Alloys by Aerosol-Assisted Chemical Vapor Deposition.
- Resource Type
- Article
- Source
Chemistry of Materials . May2017, Vol. 29 Issue 9, p3858-3862. 5p.- Subject
- *
TUNGSTEN
*THIN films
*ALLOYS
*CHEMICAL vapor deposition
*NANOLITHOGRAPHY - Language
- ISSN
- 0897-4756