Reversible electrochemical modification of the surface of a semiconductor by an atomic-force microscope probe.
- Resource Type
- Article
- Authors
- Kozhukhov, A.; Sheglov, D.; Latyshev, A.
- Source
- Semiconductors. Apr2017, Vol. 51 Issue 4, p420-422. 3p.
- Subject
- *REVERSIBLE processes (Thermodynamics)
*NUCLEAR forces (Physics)
*OHMIC resistance
*MICROSCOPY
*SEMICONDUCTORS
- Language
- ISSN
- 1063-7826
A technique for reversible surface modification with an atomic-force-microscope (AFM) probe is suggested. In this method, no significant mechanical or topographic changes occur upon a local variation in the surface potential of a sample under the AFM probe. The method allows a controlled relative change in the ohmic resistance of a channel in a Hall bridge within the range 20-25%. [ABSTRACT FROM AUTHOR]