Tantalum nitride as a diffusion barrier between Pd2Si or CoSi2 and aluminum.
- Resource Type
- Article
- Authors
- Farooq, M. A.; Murarka, S. P.; Chang, C. C.; Baiocchi, F. A.
- Source
- Journal of Applied Physics. 4/15/1989, Vol. 65 Issue 8, p3017. 6p. 1 Diagram, 13 Graphs.
- Subject
- *TRANSITION metal nitrides
*SILICIDES
*PALLADIUM compounds
*COBALT compounds
*ALUMINUM
- Language
- ISSN
- 0021-8979
Presents a study that examined the use of tantalum nitride as a diffusion barrier between palladium silicide or cobalt silicide and aluminum. Analysis of the Rutherford backscattering spectra; Evaluation of the Auger electron spectra; Characterization of the electrical properties of the palladium silicide and cobalt silicide systems.