A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD.
- Resource Type
- Article
- Authors
- Gebhard, Maximilian; Mitschker, Felix; Hoppe, Christian; Aghaee, Morteza; Rogalla, Detlef; Creatore, Mariadriana; Grundmeier, Guido; Awakowicz, Peter; Devi, Anjana
- Source
- Plasma Processes & Polymers. May2018, Vol. 15 Issue 5, p1-N.PAG. 11p.
- Subject
- *POLYETHYLENE terephthalate
*POLYMER films
*THIN films
*PLASMA-enhanced chemical vapor deposition
*SILICA
- Language
- ISSN
- 1612-8850
A combinatorial approach to deposit gas barrier layers (GBLs) on polyethylene terephthalate (PET) by means of plasma-enhanced chemical vapor deposition (PECVD) and plasma-enhanced atomic layer deposition (PEALD) is presented. Thin filmsof SiOx and SiOxCyHz obtained fromPECVDwere growneither subsequently on a PEALD seeding layer (SiO2) or were capped by ultrathin PEALD films of Al2O3 or SiO2. To study the impact of PEALDlayers on the overallGBL performance, PECVD coatings with high macro defect densities and low barrier efficiency with regard to the oxygen transmission rate (OTR) were chosen. PEALD seeding layers demonstrated the ability to influence the subsequent PECVD growth in terms of the lower macro defect density (9 macro-defects mm-2) and improved barrier performance (OTR = 0.8 cm³ m-2 day-1), while the PEALD cappingroute produced GBLs free of macro-defects. [ABSTRACT FROM AUTHOR]